| 摘要: |
| 1991～1995年利用钴60照射和亚硝酸处理进行了烟草蚀纹病毒(TEV)弱株系的选择及防病效果试验。结果表明,钴60照射病毒溶液能产生弱株突变体的适宜剂量是1. 29, 2. 58 C /kg,亚硝酸处理的适宜浓度和时间是1mol·L-1, 30～50min.经选择效果明显的弱株有R4和H38,其室内交互保护试验的效果最高分别是85. 8%和47. 4%;田间防病效果分别为81. 6%和40. 3%.两个弱株免疫后接种强株,其烟株体内病毒含量均低于强株对照。试验还表明,亚硝酸处理较钴60能产生较多的弱株突变体。 |
| 关键词: 烟草蚀纹病毒，钴60，亚硝酸，弱株系选择 |
| DOI： |
| 分类号:S435.72 |
| 基金项目: |
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| Induced Mild Strains of Tobacco Etch Virus |
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| Abstract: |
| Mild strains of tobacco etch are studied.The suitable dosage of C060 treatment is 1. 29 C/kg and 2. 58 C/kg for producing TEV mutant. The suitable density of
HNO2 treatment is 1mol·L-1 30-50min.R4 strain and H38 strain are better.The protection effect of R4 and H38 is 85. 8% and 47. 4% in greenhouse, respectively.The effect
of R4 to control tobacco etch virus is 81. 6% in the field,where as H38 is 40. 3%.The virus
content of immune plant is lower than check.The results show that HNO2 treatment can
produce moremutants than C060. |
| Key words: tobacco etch virus,mild strain,controlling virus effect |
